Publikationen

R. Marquardt, J. Cipo, F. Schlichting, G. Kolhatkar, H. Kohlstedt, H. Kersten Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters. Thin Solid Films. 742, 139046 (2021).

J. Cipo, F. Schlichting, F. Zahari, S. Gauter, H. Kohlstedt, H. Kersten Diagnostics of process plasma used for the production of memristive devices. Journal of Physics: Conference Series. 1492, 012002 (2020).

F. Zahari, F. Schlichting, J. Strobel, S. Dirkmann, J. Cipo, S. Gauter, et al. Correlation between sputter deposition parameters and I-V-characteristics in double-barrier memristive devices. Journal of Vacuum Science & Technology B. 37, 061203 (2019).

J. Cipo, H. Kersten Die Geschichte der Gasentladungsphysik – Beobachtungen, Experimente und Ergebnisse aus drei Jahrhunderten. Vakuum in Forschung und Praxis. 3021335, 34-42 (2018).