Publikationen

R. Marquardt, J. Cipo, F. Schlichting, G. Kolhatkar, H. Kohlstedt, H. Kersten Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters. Thin Solid Films. 742, 139046 (2021).

F. Zahari, F. Schlichting, J. Strobel, S. Dirkmann, J. Cipo, S. Gauter, et al. Correlation between sputter deposition parameters and I-V-characteristics in double-barrier memristive devices. Journal of Vacuum Science & Technology B. 37, 061203 (2019).