Publikationen

Autor Titel Typ [ Jahr(Asc)]
Filterkriterien: Anfangsbuchstabe Des Titels is E and Autor is H. Deutsch  [Alle Filter deaktivieren]
2001
H. Kersten, H.. Deutsch, H. Steffen, G. Kroesen, R. Hippler The energy balance at substrate surfaces during plasma processing. Vacuum. 63, 385-431 (2001).
2000
H. Kersten, E.. Stoffels, W.. Stoffels, M. Otte, C. Csambal, H.. Deutsch, et al. Energy influx from an rf plasma to a substrate during plasma processing. Journal of Applied Physics. 87, 3637 (2000).