Publikationen
Autor Titel Typ [ Jahr
]

Filterkriterien: Anfangsbuchstabe Des Titels is E and Autor is H. Deutsch [Alle Filter deaktivieren]
The energy balance at substrate surfaces during plasma processing. Vacuum. 63, 385-431 (2001).
Energy influx from an rf plasma to a substrate during plasma processing. Journal of Applied Physics. 87, 3637 (2000).