M.Sc. Felix Schlichting

Position: Wissenschaftlicher Mitarbeiter, Doktorand
Raum: 14
Telefon: 5161
E-Mail: schlichting@physik.uni-kiel.de

Publikationen

2022
F. Schlichting, L. Thormählen, J. Cipo, D. Meyners, H. Kersten Energy-dependent film growth of Cu and NiTi from a tilted DC magnetron sputtering source determined by calorimetric probe analysis. Surface and Coatings Technology. 450, 129000 (2022).
2021
R. Marquardt, J. Cipo, F. Schlichting, G. Kolhatkar, H. Kohlstedt, H. Kersten Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters. Thin Solid Films. 742, 139046 (2021).
2020
J. Cipo, F. Schlichting, F. Zahari, S. Gauter, H. Kohlstedt, H. Kersten Diagnostics of process plasma used for the production of memristive devices. Journal of Physics: Conference Series. 1492, 012002 (2020).
2019
F. Zahari, F. Schlichting, J. Strobel, S. Dirkmann, J. Cipo, S. Gauter, et al. Correlation between sputter deposition parameters and I-V-characteristics in double-barrier memristive devices. Journal of Vacuum Science & Technology B. 37, 061203 (2019).