M.Sc. Felix Schlichting
Position: Wissenschaftlicher Mitarbeiter, Doktorand
Raum: 14
Telefon: 5161
E-Mail: schlichting@physik.uni-kiel.de Publikationen
Energy-dependent film growth of Cu and NiTi from a tilted DC magnetron sputtering source determined by calorimetric probe analysis. Surface and Coatings Technology. 450, 129000 (2022). |
Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters. Thin Solid Films. 742, 139046 (2021). |
Diagnostics of process plasma used for the production of memristive devices. Journal of Physics: Conference Series. 1492, 012002 (2020). |
Correlation between sputter deposition parameters and I-V-characteristics in double-barrier memristive devices. Journal of Vacuum Science & Technology B. 37, 061203 (2019). |